Atomic layer deposition offers a simple and scalable method for depositing films with uniform optical properties on new nanostructured, highly curved, and freeform optics. Material versatility and interface engineering allow ALD to easily fabricate antireflective, highly absorbing and highly reflective coatings for use in a myriad of applications including, mobile camera lenses, LiDAR sensors, and extended reality devices. With traditional coating techniques, it is nearly impossible to achieve the same conformality and uniformity on complex optics as enabled by ALD.

ALD enables conformal sidewall passivation, controlled surface passivation, final passivation, and anti-reflective coatings necessary for next generation compound semiconductor optoelectronics.